脉冲偏压占空比对TiSiN薄膜结构和性能的影响

doi:10.13251/j.issn.0254-6051.2022.08.046

摘要/Abstract

摘要： 采用电弧离子镀方法,通过改变脉冲偏压占空比在M2高速钢和单晶硅片基体上沉积TiSiN薄膜,研究脉冲偏压占空比对TiSiN薄膜形貌结构、元素成分、相结构、纳米硬度和耐蚀性能的影响。脉冲偏压占空比为30%时,TiSiN薄膜表面的大颗粒数目达到最大值832个,占空比为60%时,大颗粒数目减小到451个;脉冲偏压占空比从20%增加到50%,Si试样表面的膜层厚度从390.8 nm增加到2.339 μm;占空比为30%时,Si在薄膜中的含量最高为13.88at%,(220)晶面为择优取向,晶粒尺寸达到最小值5.05 nm,硬度达到28.34 GPa,自腐蚀电流密度达到最小0.5306 μA/cm²;占空比为40%时,(111)晶面为择优取向,Si的含量降低到最小值0.46at%;占空比为50%时,(111)晶面的晶粒尺寸达到13.22 nm,硬度达到最大值42.08 GPa,自腐蚀电位达到最高值-0.324 V(vs SCE)。40%以上的占空比可以减少大颗粒缺陷数量,降低TiSiN薄膜中的Si含量,改变TiSiN薄膜晶粒生长的择优取向,提高薄膜的硬度和耐蚀性能。

关键词: 电弧离子镀, TiSiN薄膜, 占空比, 纳米硬度, 耐蚀性

Abstract: Arc ion plating method was used to deposit TiSiN films on M2 high-speed steel(M2 HSS) and Si wafer substrates by changing the pulsed bias duty ratio. Effect of pulsed bias duty ratio on morphology, element composition, phase structure, nano-hardness and corrosion resistance of the TiSiN films was studied. The results show that when the pulsed bias duty ratio is 30%, the number of macroparticles on the surface of the TiSiN film reaches a maximum of 832, and when the duty ratio is 60%, the number of macroparticles decreases to 451. With the increases of pulsed bias duty ratio from 20% to 50%, the film thickness on the surface of the Si specimen increases from 390.8 nm to 2.339 μm. When the duty ratio is 30%, the content of Si element in the film is up to 13.88at%, the (220) crystal plane is the preferred orientation, the grain size reaches the minimum value of 5.05 nm, the hardness reaches 28.34 GPa, and the self-corrosion current density reaches the minimum value of 0.5306 μA/cm². When the duty ratio is 40%, the (111) crystal plane is the preferred orientation, the content of Si element is reduced to the minimum value of 0.46at%. When the duty ratio is 50%, the grain size of the (111) crystal plane reaches 13.22 nm, the hardness reaches the maximum value of 42.08 GPa, and the self-corrosion potential reaches the maximum value of -0.324 V (vs SCE). When the duty ratio is more than 40%, the number of macroparticle defects and the Si content in the TiSiN film are reduced. Meanwhile the preferred orientation of grain growth of the TiSiN film changes from (220) to (111), and the hardness and corrosion resistance of the TiSiN films are improved.

Key words: arc ion plating, TiSiN film, duty ratio, nano-hardness, corrosion resistance

中图分类号:

TG174.444

魏永强, 顾艳阳, 赵重轻, 蒋志强. 脉冲偏压占空比对TiSiN薄膜结构和性能的影响[J]. 金属热处理, 2022, 47(8): 279-286.

Wei Yongqiang, Gu Yanyang, Zhao Zhongqing, Jiang Zhiqiang. Effect of pulsed bias duty ratio on structure and properties of TiSiN film[J]. Heat Treatment of Metals, 2022, 47(8): 279-286.

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