金属间化合物Ni3Al薄膜制备工艺

doi:10.13251/j.issn.0254-6051.2020.05.036

摘要/Abstract

摘要： 采用直流磁控共溅射法,通过一步法、两步法工艺在衬底为SiO₂基体上制备了厚度为500 nm的Ni₃Al薄膜,X射线衍射(XRD)和透射电镜(TEM)等测试表明,一步法工艺制备的Ni₃Al薄膜为(111)取向的多晶型晶体结构金属间化合物优于两步法工艺。采用光学显微镜观察Ni-Al合金薄膜和金属间化合物Ni₃Al薄膜经高温氧化后的形貌,结果表明,Ni₃Al金属间化合物薄膜的高温抗氧化性能明显优于Ni-Al合金薄膜。

关键词: Ni₃Al薄膜, 磁控溅射, 微观结构, 高温抗氧化性

Abstract: By means of DC magnetron co-sputtering, a 500 nm thick Ni₃Al thin film was prepared on the substrate of SiO₂ by one-step method or two-step method. Test results of X-ray diffraction(XRD) and transmission electron microscopy(TEM) show that the (111) oriented intermetallic compound with polycrystalline structure in Ni₃Al thin film prepared by one-step method is better than that by the two-step process. The morphology of Ni-Al alloy thin film and intermetallic compound Ni₃Al thin film after high temperature oxidation was observed by means of metallographic microscope. The results show that the high temperature antioxidant properties of Ni₃Al intermetallic compound films are obviously better than the Ni-Al alloy films.

Key words: Ni₃Al thin film, magnetron sputtering, microstructure, high temperature oxidation resistance

中图分类号:

TG146.2

王明, 纪红, 卢硕. 金属间化合物Ni₃Al薄膜制备工艺[J]. 金属热处理, 2020, 45(5): 183-186.

Wang Ming, Ji Hong, Lu Shuo. Preparation technology of Ni₃Al thin film of intermetallic compounds[J]. Heat Treatment of Metals, 2020, 45(5): 183-186.

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金属间化合物Ni₃Al薄膜制备工艺

Preparation technology of Ni₃Al thin film of intermetallic compounds

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