金属热处理 ›› 2021, Vol. 46 ›› Issue (1): 143-148.DOI: 10.13251/j.issn.0254-6051.2021.01.027

• 表面工程 • 上一篇    下一篇

铬过渡层对氮化铬/镁合金膜基界面结合强度的影响

刘瑞霞1,3, 郭锋2,3, 韩海鹏2   

  1. 1.内蒙古鄂尔多斯职业学院 机电工程系,内蒙古 鄂尔多斯 017000;
    2.内蒙古自治区涂层与薄膜重点实验室,内蒙古 呼和浩特 010051;
    3.内蒙古工业大学 材料科学与工程学院,内蒙古 呼和浩特 010051
  • 收稿日期:2020-06-15 出版日期:2021-01-25 发布日期:2021-01-26
  • 通讯作者: 郭锋,教授,博士,E-mail:guofengnmg@sina.com
  • 作者简介:刘瑞霞(1982—),女,讲师,硕士,主要研究方向为金属材料表面处理,E-mail:84952497@qq.com。
  • 基金资助:
    内蒙古自治区科技重大专项(2018-810)

Effect of chromium transition layer on interface bonding strength between chromium nitride film and magnesium alloy substrate

Liu Ruixia1,3, Guo Feng2,3, Han Haipeng2   

  1. 1. Department of Mechanical and Electrical Engineering,Ordos Vocational College,Ordos Inner Mongolia 017000,China;
    2. Inner Mongolia Key Laboratory of Coating and Film,Hohhot Inner Mongolia 010051,China;
    3. School of Materials Science and Engineering,Inner Mongolia University of Technology,Hohhot Inner Mongolia 010051,China
  • Received:2020-06-15 Online:2021-01-25 Published:2021-01-26

摘要: 为了提高磁控溅射氮化铬膜与镁合金基底的结合强度,在两者之间以不同工艺溅射沉积铬过渡层,分析并讨论了铬过渡层对膜基界面结合强度的影响及其机制。结果表明,在镁合金/氮化铬之间增加铬过渡层可提高表征膜基结合强度的膜层破裂临界载荷,且当铬过渡层的溅射工艺为溅射功率100 W、负偏压30 V、基底温度25 ℃、溅射时间4 min时膜层破裂临界载荷最大,此工艺下铬过渡层表面在微观上具有最大的粗糙度和最小的突起间隔;铬过渡层增强界面结合的作用主要表现为改善了氮化铬与镁合金基底之间的结合状况,与铬/氮化铬接界面积较大且能有效机械互锁、铬过渡层缓减了界面应力等机制有关。

关键词: 镁合金, 磁控溅射, 氮化铬膜, 铬过渡层, 膜基结合强度

Abstract: To improve the bonding strength of magnetron sputtering chromium nitride film and magnesium alloy substrate,the chromium transition layer was deposited by different magnetron puttering processes between them,the influence of chromium transition layer on interface bonding strength between film and substrate and its mechanism were analyzed and discussed.The results show that adding chromium transition layer can increase the fracture critical load of film which characterizes the bonding strength of film and substrate,and the fracture critical load of film reaches the largest when the magnetron sputtering process of chromium transition layer is 100 W of sputtering power,30 V of negative bias voltage,25 ℃ of substrate temperature and 4 min of sputtering time,in which process the surface of chromium transition layer has the largest roughness and the smallest protuberance interval.The enhancing action of chromium transition layer on interface bonding is mainly reflected by improving the bonding between chromium nitride and magnesium alloy substrate,it is related to the larger contact area and the effective mechanical interlock between chromium transition layer and chromium nitride film,as well as the reduction of interface stress by chromium transition layer.

Key words: magnesium alloy, magnetron sputtering, chromium nitride film, chromium transition layer, bonding strength of film and substrate

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