氧化工艺对GH2132合金抗氧化性能的影响

doi:10.13251/j.issn.0254-6051.2024.06.008

金属热处理 ›› 2024, Vol. 49 ›› Issue (6): 49-54.DOI: 10.13251/j.issn.0254-6051.2024.06.008

氧化工艺对GH2132合金抗氧化性能的影响

徐超凡, 陈佳俊, 王守乾, 赵守忠, 沈佳宝, 闵亮

江苏科技大学材料科学与工程学院, 江苏镇江 212100

收稿日期:2023-12-01 修回日期:2024-04-17 出版日期:2024-06-25 发布日期:2024-07-29
作者简介:徐超凡(1997—),男,硕士,主要研究方向为高温合金,E-mail: 3298289464@qq.com

Effect of oxidation process on oxidation resistance of GH2132 alloy

Xu Chaofan, Chen Jiajun, Wang Shouqian, Zhao Shouzhong, Shen Jiabao, Min Liang

School of Materials Science and Engineering, Jiangsu University of Science and Technology, Zhenjiang Jiangsu 212100, China

Received:2023-12-01 Revised:2024-04-17 Online:2024-06-25 Published:2024-07-29

摘要/Abstract

摘要： 对GH2132合金进行900 ℃和650 ℃的氧化试验,利用XRD分析了氧化膜的主要产物,利用扫描电镜观察氧化膜的表面及截面形貌,结合EDS能谱数据,研究了GH2132合金的氧化机理。结果表明,在900 ℃下,GH2132合金氧化膜主要由Cr₂O₃+Fe₂O₃组成,抗氧化性能在100~200 h由抗氧化性转变为完全抗氧化性,随着氧化保温时间的延长,发生内氧化,生成的氧化膜会产生剥落,到500 h,内氧化深度达到110.34 μm;在650 ℃下,GH2132合金表层氧化膜主要由Fe₂O₃、少量的Fe+2Cr₂O₄及Fe_0.64Ni_0.36组成,始终为完全抗氧化性,氧化膜紧实,没有内氧化现象,到1600 h,氧化膜厚度为15.17 μm,合金在650 ℃下可长期使用。

关键词: GH2132合金, 氧化物, 抗氧化性, 氧化质量增量

Abstract: Oxidation test of GH2132 alloy was carried out at 900 ℃ and 650 ℃, the main products of the oxide film were analysed by XRD, the surface and cross-section morphologies of the oxide film were observed by scanning electron microscope, and the oxidation mechanism of the GH2132 alloy was investigated combining with the data of EDS energy spectra. The results show that at 900 ℃, the oxide film of the GH2132 alloy is mainly composed of Cr₂O₃+Fe₂O₃, and the antioxidant property changes from antioxidant properties to complete antioxidant properties in 100-200 h. With the extension of the oxidation holding time, internal oxidation phenomenon occurs and the generated oxide film flakes off, and the depth of internal oxidation reaches 110.34 μm by 500 h. At 650 ℃, the GH2132 alloy surface oxide film mainly consists of Fe₂O₃ and small amounts of Fe+2Cr₂O₄ and Fe_0.64Ni_0.36, which is always completely antioxidant properties with compact oxide film, and there is no internal oxidation phenomenon. When up to 1600 h, the thickness of the oxide film is 15.17 μm, indicating that the alloy can be used for a long time at 650 ℃.

Key words: GH2132 alloy, oxides, oxidation resistance, oxidation mass increment

中图分类号:

TG132.2

徐超凡, 陈佳俊, 王守乾, 赵守忠, 沈佳宝, 闵亮. 氧化工艺对GH2132合金抗氧化性能的影响[J]. 金属热处理, 2024, 49(6): 49-54.

Xu Chaofan, Chen Jiajun, Wang Shouqian, Zhao Shouzhong, Shen Jiabao, Min Liang. Effect of oxidation process on oxidation resistance of GH2132 alloy[J]. Heat Treatment of Metals, 2024, 49(6): 49-54.

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氧化工艺对GH2132合金抗氧化性能的影响

Effect of oxidation process on oxidation resistance of GH2132 alloy

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