磁控溅射铜靶晶粒度对溅射性能与沉积性能的影响
王帅康, 唐宾, 鲍明东, 展尚松, 王铎, 易晨曦
Effect of grain size of magnetron sputtering copper target on sputtering performance and deposition performance
Wang Shuaikang, Tang Bin, Bao Mingdong, Zhan Shangsong, Wang Duo, Yi Chenxi
金属热处理
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2022, (11): 261
-265
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DOI: 10.13251/j.issn.0254-6051.2022.11.044