靶基间距对电弧离子镀中大颗粒形貌和分布的影响
魏永强, 文振华, 蒋志强, 冯宪章, 田修波
Influence of distance between target and substrate on morphology and distribution of macroparticles during arc ion plating
Wei Yongqiang, Wen Zhenhua, Jiang Zhiqiang, Feng Xianzhang, Tian Xiubo
金属热处理
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2014, (7): 130
-134
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DOI: 10.13251/j.issn.0254-6051.2014.07.031