离子渗氮对TiN薄膜组织与性能的影响
冯军1, 2，金凡亚1，童洪辉1，沈丽如1，但敏1，邓稚1，赖新春3
Effects of plasma nitriding on microstructure and properties of TiN thin film
Feng Jun1, 2, Jin Fanya1, Tong Honghui1, Shen Liru1, Dan Min1, Deng Zhi, Lai Xinchun3
金属热处理
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2015, (2): 140
-143
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DOI: 10.13251/j.issn.0254-6051.2015.02.030