Heat Treatment of Metals ›› 2020, Vol. 45 ›› Issue (5): 183-186.DOI: 10.13251/j.issn.0254-6051.2020.05.036

• PROCESS RESEARCH • Previous Articles     Next Articles

Preparation technology of Ni3Al thin film of intermetallic compounds

Wang Ming, Ji Hong, Lu Shuo   

  1. Technology Center, China United Test & Certification Co., Ltd., Beijing 101499, China
  • Received:2019-11-10 Online:2020-05-25 Published:2020-09-02

Abstract: By means of DC magnetron co-sputtering, a 500 nm thick Ni3Al thin film was prepared on the substrate of SiO2 by one-step method or two-step method. Test results of X-ray diffraction(XRD) and transmission electron microscopy(TEM) show that the (111) oriented intermetallic compound with polycrystalline structure in Ni3Al thin film prepared by one-step method is better than that by the two-step process. The morphology of Ni-Al alloy thin film and intermetallic compound Ni3Al thin film after high temperature oxidation was observed by means of metallographic microscope. The results show that the high temperature antioxidant properties of Ni3Al intermetallic compound films are obviously better than the Ni-Al alloy films.

Key words: Ni3Al thin film, magnetron sputtering, microstructure, high temperature oxidation resistance

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