Heat Treatment of Metals ›› 2021, Vol. 46 ›› Issue (11): 236-240.DOI: 10.13251/j.issn.0254-6051.2021.11.042

• SURFACE ENGINEERING • Previous Articles     Next Articles

Influence of fabrication technology on surface morphology of giant magnetostrictive Fe-Ga alloy film

Shen Zhi1, Yan Jianwu1, Jin Kang2, Zhou Yingli3, Yin Jian2   

  1. 1. School of Mechanical Engineering, Nanchang Institute of Technology, Nanchang Jiangxi 330099, China;
    2. Beijing Research Institute of Mechanical & Electrical Technology Ltd., Beijing 100083, China;
    3. Beijing National Innovation Institute of Lightweight Ltd., Beijing 100083, China
  • Received:2021-08-17 Online:2021-11-25 Published:2021-12-08

Abstract: Fe-Ga alloy films were prepared by JZCK-600F multifunctional coating equipment, and the effect of sputtering technology on deposition rate and surface morphology of the Fe-Ga alloy films was investigated. The surface morphology and composition of the films were studied by SEM and EDS. The results show that sputtering time and power are the main factors that affect the thickness and growth rate of Fe-Ga alloy film when other process parameters are not changed. The thickness and deposition rate of the films increase with the increase of sputtering time and power and showing a positive proportional relationship between the film thickness and sputtering time and power. However, when the film thickness is too large, the increased internal stress may make the film peel off. When the sputtering power is too high, the internal stress may also induce inner cracks in the thin film. The magnetic domain images of Fe-Ga alloy films show obvious contrast between light and dark. The shape of the domain is irregular and round, similar to the structure of coral. The Fe-Ga alloy films prepared by magnetron sputtering have good crystallization and growth, and the morphology of the films is uniform and compact granular structure. The optimized sputtering parameters are sputtering power of 80 W, sputtering pressure of 0.6 Pa, sputtering time of 60 min and Ar gas flow of 25 mL/min. By which, the deflection of magnetostrictive thin film cantilever fabricated is 69.048 μm, which can meet the requirements of the fabrication of micro-devices.

Key words: Fe-Ga alloy film, magnetron sputtering technology, surface morphology, magnetic domain, magnetic properties

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