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Effect of annealing temperature on microstructure and adhesion strength of Ru films deposited by DC magnetron sputtering

  

  1. 1. School of Material Science and Engineering, Jiangsu University of Science and Technology; 2. HY Times Electronic Science and Technology Co., Ltd.; 3. Patent Examination Cooperation Jiangsu Center of The Patent Office SIPO
  • Online:2016-06-25 Published:2016-07-04

Key words: magnetron sputtering, Ru films, annealing temperature, adhesion strength

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