Effect of oxidation process on oxidation resistance of GH2132 alloy

doi:10.13251/j.issn.0254-6051.2024.06.008

Abstract

Abstract: Oxidation test of GH2132 alloy was carried out at 900 ℃ and 650 ℃, the main products of the oxide film were analysed by XRD, the surface and cross-section morphologies of the oxide film were observed by scanning electron microscope, and the oxidation mechanism of the GH2132 alloy was investigated combining with the data of EDS energy spectra. The results show that at 900 ℃, the oxide film of the GH2132 alloy is mainly composed of Cr₂O₃+Fe₂O₃, and the antioxidant property changes from antioxidant properties to complete antioxidant properties in 100-200 h. With the extension of the oxidation holding time, internal oxidation phenomenon occurs and the generated oxide film flakes off, and the depth of internal oxidation reaches 110.34 μm by 500 h. At 650 ℃, the GH2132 alloy surface oxide film mainly consists of Fe₂O₃ and small amounts of Fe+2Cr₂O₄ and Fe_0.64Ni_0.36, which is always completely antioxidant properties with compact oxide film, and there is no internal oxidation phenomenon. When up to 1600 h, the thickness of the oxide film is 15.17 μm, indicating that the alloy can be used for a long time at 650 ℃.

Key words: GH2132 alloy, oxides, oxidation resistance, oxidation mass increment

CLC Number:

TG132.2

Xu Chaofan, Chen Jiajun, Wang Shouqian, Zhao Shouzhong, Shen Jiabao, Min Liang. Effect of oxidation process on oxidation resistance of GH2132 alloy[J]. Heat Treatment of Metals, 2024, 49(6): 49-54.

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