Effect of pulsed bias frequency on microstructure and properties of TiSiN film
Wei Yongqiang, Song Rufan, Jiang Zhiqiang
2021, 46(11):
213-219.
doi:10.13251/j.issn.0254-6051.2021.11.038
Abstract
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PDF (608KB)
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Pulsed bias arc ion plating technology was used to deposit TiSiN film on M2 high-speed steel substrate by changing pulsed bias frequency. Effect of pulsed bias frequency on surface and cross-sectional morphologies, element composition and phase structure of the TiSiN films, and the nanohardness and elastic modulus of the TiSiN films were tested by means of nanoindenter, scanning electron microscope (SEM), energy spectrometer (EDS), X-ray diffractometer (XRD) and other instruments. Within the statistical field of view(9×103 μm2), the macro-particle diameter on the surface of the TiSiN films varies between 0.30 and 7.26 μm. With the increase of pulsed bias frequency from 40 kHz to 60 kHz, the number of macro-particles on the surface of the TiSiN films reduces from 495 to 356. As the pulsed bias frequency increases to 80 kHz, the number of macro-particles increases to 657. With the pulsed bias frequency of 60 kHz, the numbers of macro-particles and micro-pit defects on the surface of the TiSiN films are the least and the Si atom content reaches the minimum value of 0.46%. When the pulsed bias frequency is 50 kHz, the TiSiN films grow in a non-columnar structure, and the thickness reaches the minimum value of 1.63 μm. When the pulsed bias frequency is 60 kHz, the columnar crystal structure is refined, and the density of the films increases. The TiSiN films has a preferred orientation at the (111) crystal plane under different pulsed bias frequencies, but no Si peak is detected. Amorphous Si3N4 exists in the TiSiN films, the TiN crystals and Si3N4 amorphous structure form the composite structure. At the pulsed bias frequency of 60 kHz, the mount of the macro-particles on the TiSiN films surface reaches the minimum value. The nanohardness of the TiSiN films at the pulsed bias frequency of 60 kHz reaches 34.56 GPa, which is about three times higher than that of the M2 high-speed steel substrate. When the pulsed bias frequency is 50 kHz, the corrosion potential of the TiSiN film reaches the maximum value -0.352 V(vs SCE), which is 723 mV higher than that of the substrate, and the corrosion current density reaches the value of 0.73 μA/cm2. When the pulsed bias frequency is 70 kHz, the corrosion potential of the TiSiN film reaches the value -0.526 V(vs SCE), and the corrosion current density reaches the minimum value of 0.66 μA/cm2.